Simulation of Dose Deposition in Resist used in Deep X-ray Lithography

Forschungsthema/Bereich

Mechanical engineering, electrical engineering, and related programs of study

Typ der Abschlussarbeit

Master

Startzeitpunkt

06.04.2026

Bewerbungsschluss

03.04.2026

Dauer der Arbeit

6 Months

Beschreibung

X-ray LIGA process is a unique lithography process for 2.5D fabrication of microstructures with extremely precise vertical sidewalls and high aspect ratio, which are often unachievable with traditional optical lithography. Recently, new approaches to directly pattern material into a 3D micro and nanostructures become of great interest.
For this purpose, the focus of the master project is on modelling the deep X-ray lithography process for 3D microstructure fabrication where the sample rotates under a fixed X-ray mask/pattern. Using Monte Carlo simulations (for example PENELOPE program or python repositories), you will evaluate the spatial dose distribution, and resist development, and investigate how rotational exposure influences final structure geometry. The resulting data will be explored to advance deep X-ray lithography into a 3D micro and nanofabrication.
This is a comprehensive project that offers the opportunity to study numerical calculation of dose calculations and to improve your programming skills. To carry out the work, you will be fully integrated in the research work in the department of X-ray Micro-Technologies with diverse expertise from engineering, physics, computer and biomedical sciences. Intensive support ensures that the work can be carried out within the given time frame.

Voraussetzung

Voraussetzungen an Studierende

• Experience with Python, Fortran or a similar programming language
• Basic knowledge of lithography process
• Problem-solving mindset and an independent working style

Studiengangsbereiche

• Ingenieurwissenschaften
  Bauingenieurwesen
  Chemieingenieurwesen & Verfahrenstechnik
  Elektrotechnik & Informationstechnik
  Maschinenbau
  Materialwissenschaft & Werkstofftechnik
  Optics & Photonics
  Mechanical Engineering

Betreuung

Titel, Vorname, Name

Dr Pascal Mayer

Organisationseinheit

IMT

E-Mail Adresse

pascal.meyer@kit.edu

Link zur eigenen Homepage/Personenseite

Website

Bewerbung per E-Mail

Bewerbungsunterlagen

• Anschreiben
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E-Mail Adresse für die Bewerbung
Senden Sie die oben genannten Bewerbungsunterlagen bitte per Mail an pascal.meyer@kit.edu


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